Rapid heat treatment device for heat treatment of a micro-electronic substrate by infrared radiation includes cold-walled infrared halogen lamps arranged in a cold walled reaction chamber

摘要

Rapid heat treatment device includes cold-walled infrared halogen lamps arranged in a cold walled reaction chamber. A rapid heat treatment device comprises infrared halogen lamps (2) arranged in a reaction chamber with cold metal walls (12). Each lamp has a first tubular quartz envelope (8) concentric with an outer quartz envelope (9) which forms the outer wall of a channel (10) for the circulation of a cooling liquid transparent to infrared radiation, to form cold-walled lamps. The cooling liquid includes compounds with a halogen-saturated carbon chain or compounds with a halogen-saturated oxygen and carbon chain. Each lamp also includes an intermediate tubular casing (17), arranged to delimit a tubular space (18) with the first casing and to make up an internal wall for the circulation channel. The tubular space maintains the first casing at a temperature between 200 and 900 degreesC.