首页> 外国专利> METHOD AND APPARATUS FOR FORMING MEMBRANE, METHOD AND APPARATUS FOR MANUFACTURING LIQUID CRYSTAL DEVICE, LIQUID CRYSTAL DEVICE, METHOD AND APPARATUS FOR MANUFACTURING MEMBRANE STRUCTURE, MEMBRANE STRUCTURE AND ELECTRONIC DEVICE

METHOD AND APPARATUS FOR FORMING MEMBRANE, METHOD AND APPARATUS FOR MANUFACTURING LIQUID CRYSTAL DEVICE, LIQUID CRYSTAL DEVICE, METHOD AND APPARATUS FOR MANUFACTURING MEMBRANE STRUCTURE, MEMBRANE STRUCTURE AND ELECTRONIC DEVICE

机译:形成膜的方法和装置,制造液晶装置的方法和装置,液态晶体装置,制造膜结构,膜结构和电子装置的方法和装置

摘要

PROBLEM TO BE SOLVED: To provide a membrane forming apparatus constituted so as not only to suppress the waste of a material by employing an ink jet coating method but also to uniformize the thickness of a membrane to be formed as a whole, a method for forming the membrane, an apparatus and a method for manufacturing a liquid crystal device, a liquid crystal device, an apparatus and a method for manufacturing a membrane structure, the membrane structure and an electronic device.;SOLUTION: The membrane forming apparatus 1 is constituted so as to coat a substrate SUB with a coating solution prepared by dissolving or dispersing a membrane material in a solvent to form a membrane. This apparatus is equipped with a liquid droplet discharge means having a liquid droplet discharge head 2 for discharging the coating solution to the substrate SUB, a moving means 4 for relatively moving the liquid droplet discharge head 2 and the position of the substrate SUB and a control part C for controlling at least one of the liquid droplet discharge means and the moving means 4, and has an inert gas supply means 5 for supplying an inert gas containing vapor of at least one kind of a solvent to the vicinity of the coating solution applied to the substrate SUB.;COPYRIGHT: (C)2005,JPO&NCIPI
机译:解决问题的方法:提供一种成膜装置,该成膜装置不仅构成为通过采用喷墨涂布法来抑制材料的浪费,而且使要形成的膜的整体厚度均匀。膜,液晶装置的制造装置和方法,液晶装置,膜结构的制造装置和方法,膜构造以及电子设备。解决方案:膜形成装置1构成为用涂覆溶液涂覆衬底SUB的方法是通过将膜材料溶解或分散在溶剂中以形成膜而制备的。该设备配备有液滴排放装置,该液滴排放装置具有用于将涂覆溶液排放到基板SUB的液滴排放头2,用于使液滴排放头2和基板SUB的位置相对移动的移动装置4以及控制装置。部分C用于控制液滴排放装置和移动装置4中的至少一个,并且具有惰性气体供应装置5,该惰性气体供应装置5将包含至少一种溶剂的蒸气的惰性气体供应到所涂覆的涂布液附近。 SUB。; COPYRIGHT:(C)2005,JPO&NCIPI

著录项

  • 公开/公告号JP2005040688A

    专利类型

  • 公开/公告日2005-02-17

    原文格式PDF

  • 申请/专利权人 SEIKO EPSON CORP;

    申请/专利号JP20030201684

  • 发明设计人 MORIYAMA HIDEKAZU;

    申请日2003-07-25

  • 分类号B05C5/00;B05C11/10;B05D3/04;B05D7/00;B41J2/01;

  • 国家 JP

  • 入库时间 2022-08-21 22:33:42

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