首页> 外国专利> ELECTROLYTIC COPPER FOIL, AND ELECTROLYTIC POLISHING METHOD FOR SHINY FACE OF ELECTROLYTIC COPPER FOIL

ELECTROLYTIC COPPER FOIL, AND ELECTROLYTIC POLISHING METHOD FOR SHINY FACE OF ELECTROLYTIC COPPER FOIL

机译:电解铜箔及电解抛光铜箔光亮面的方法

摘要

PROBLEM TO BE SOLVED: To provide copper foil for a printed circuit board in which the adhesion between the shiny face therein and a resist is excellent, and further, whose profile is reduced by improving its adhesive strength in the case of being tightly stuck with a resin substrate in the shiny face at a low cost.;SOLUTION: In the electrolytic copper foil, the shiny face foil is provided with pulse-like irregularity with indefinite length formed by electrolytic polishing. In the electrolytic polishing method for the shiny face of electrolytic copper foil, using a sulfuric acid-copper sulfate bath as an electrolytic solution, the shiny face of the electrolytic copper foil is subjected to electrolytic polishing treatment. In the electrolytic polishing method for the shiny face of electrolytic copper face, an anode is arranged at the rough surface side of the electrolytic copper foil, a cathode is arranged at the shiny face side, and electrolytic treatment is performed, thus the rough surface of the copper foil is subjected to smooth plating treatment, and further, the shiny face of the copper foil is subjected to reverse electrolytic polishing treatment.;COPYRIGHT: (C)2005,JPO&NCIPI
机译:解决的问题:提供一种用于印刷电路板的铜箔,该铜箔中的光亮面与抗蚀剂之间的粘合性极好,此外,通过将其牢固地粘附在铝箔上,可通过提高其粘合强度来降低其轮廓。解决方案:在电解铜箔中,亮面箔具有通过电解抛光形成的不确定长度的脉冲状不规则形状。在电解铜箔的光泽面的电解抛光方法中,使用硫酸铜硫酸盐浴作为电解液,对电解铜箔的光泽面进行电解抛光处理。在电解铜面的光面的电解研磨方法中,在电解铜箔的粗糙面侧配置阳极,在发光面侧配置阴极,进行电解处理,由此对电解铜箔的粗糙面进行电解处理。铜箔要经过平滑的电镀处理,再对铜箔的光亮面进行反向电解抛光处理。;版权所有:(C)2005,日本特许会计师事务所

著录项

  • 公开/公告号JP2005240132A

    专利类型

  • 公开/公告日2005-09-08

    原文格式PDF

  • 申请/专利权人 NIKKO MATERIALS CO LTD;

    申请/专利号JP20040053299

  • 发明设计人 IIDA KAZUHIKO;AKASE FUMIAKI;

    申请日2004-02-27

  • 分类号C25D7/06;H05K1/09;

  • 国家 JP

  • 入库时间 2022-08-21 22:31:38

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