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Inert gas purge method and apparatus, exposure apparatus, reticle stocker, reticle inspection apparatus, reticle transfer box, and device manufacturing method
Inert gas purge method and apparatus, exposure apparatus, reticle stocker, reticle inspection apparatus, reticle transfer box, and device manufacturing method
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机译:惰性气体吹扫方法及装置,曝光装置,分划板储存器,分划板检查装置,分划板交接箱及装置的制造方法
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摘要
The object of this invention is to provide a technique of effectively purging a space almost closed with a master and pellicle film with inert gas in an exposure apparatus which uses ultraviolet rays as exposure light, purges the interior of the apparatus with inert gas, and projects the pattern of a master onto a photosensitive substrate via a projection optical system. To achieve this object, a plurality of vent holes are formed in a structure obtained by surrounding by a surrounding member a gas purge space to be purged with inert gas. A vessel which forms a space around the structure is filled with inert gas to cause inert gas to enter the gas purge space, purging the gas purge space with inert gas.
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