EUV LITHOGRAPHIC PROJECTION APPARATUS COMPRISING AN OPTICAL ELEMENT WITH A SELF-ASSEMBLED MONOLAYER, OPTICAL ELEMENT WITH A SELF-ASSEMBLED MONOLAYER, METHOD OF APPLYING A SELF-ASSEMBLED MONOLAYER, DEVICE MANUFACTURING METHOD AND DEVICE MANUFACTURED THEREBY

摘要

ABSTRACTEUV Lithographic Projection Apparatus comprising an Optical Element with a Self Assembled Monolayer, Optical Element with a Self-Assembled Monolayer, Method of applying a Self-Assembled Monolayer, Device Manufacturing Method and Device Manufactured therebyAn EUV lithographic apparatus which contains an optical element, the surface of saidoptical element being modified to reduce the effects of reflectivity reduction by molecularcontamination. The surface is modified such that it comprises a self assembled monolayer.Figure 1