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METHOD FOR QUANTIFYING UNIFORMITY PATTERNS AND INCLUSION OF EXPERT KNOWLEDGE FOR TOOL DEVELOPMENT AND CONTROL
METHOD FOR QUANTIFYING UNIFORMITY PATTERNS AND INCLUSION OF EXPERT KNOWLEDGE FOR TOOL DEVELOPMENT AND CONTROL
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机译:统一性模型的量化方法及工具开发与控制的专家知识
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摘要
A kind of system and method, a kind of amount including collection about each semiconductor wafer in one group of semiconductor wafer of multiple uniformity metric values of determining semiconductor wafer manufacturing process. The data volume of collection is that calibration and principal component analysis (PCA) are collected, proportional amount data, is used for first group of semiconductor wafer to generate first group of measurement. First group of metric includes the first load matrix and one first score matrix.
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