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Hybrid Method of AIP and Sputtering for Superhard coatings Ti-Si-N

机译:Ti-Si-N超硬涂层AIP和溅射的混合方法

摘要

PURPOSE: A method for three-dimensionally depositing Ti-Si-N based rigid coating film on mold, high speed steel tool or hard metal tool through hybrid process of arc ion plating and sputtering is provided. CONSTITUTION: In a method for depositing a Ti-Si-N based rigid coating film on the surface of mold and tool through arc ion plating and sputtering, the method for depositing the Ti-Si-N based rigid coating film comprises first step (S12,S13) of evacuating a chamber in which the mold and tool are installed, and heating the chamber; second step (S14) of cleaning the mold and tool by flowing Ar gas into the chamber and impressing bias to the Ar gas; third step (S15) of blocking inflow of Ar gas into the chamber, applying vacuum into the chamber and heating the chamber again; fourth step (S16) of flowing Ar gas and N2 gas into the chamber and impressing bias to the Ar gas and N2 gas; and fifth step (S17) of depositing a Ti-Si-N based rigid coating film on the surface of the mold and tool by impressing power supply to Ti target using the arc ion plating and Si target using the sputtering respectively.
机译:目的:提供一种通过电弧离子镀和溅射混合工艺在模具,高速钢工具或硬质金属工具上三维沉积Ti-Si-N基刚性涂膜的方法。组成:在通过电弧离子镀和溅射在模具和工具表面上沉积Ti-Si-N基刚性涂膜的方法中,该Ti-Si-N基刚性涂膜的沉积方法包括第一步(S12) (S13)排空装有模具和工具的腔室,并加热该腔室;第二步骤(S14),通过使氩气流入腔室并向氩气施加偏压来清洁模具和工具。第三步骤(S15),阻止氩气流入腔室,向腔室内施加真空并再次加热腔室。第四步骤(S16),使Ar气和N2气流入腔室内,并对Ar气和N2气施加偏压。第五步骤(S17)是通过分别利用电弧离子镀施加到Ti靶和利用溅射施加到Si靶的电源来在模具和工具的表面上沉积Ti-Si-N基刚性涂膜。

著录项

  • 公开/公告号KR100461980B1

    专利类型

  • 公开/公告日2004-12-14

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20020013274

  • 发明设计人 김광호;최성룡;윤순영;

    申请日2002-03-12

  • 分类号C23C14/22;

  • 国家 KR

  • 入库时间 2022-08-21 22:06:11

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