ILLUMINATION SYSTEM, PROJECTION EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD FOR REDUCING LOSS OF LIGHT QUANTITY AND SHORTENING EXPOSURE TIME BY ILLUMINATING ILLUMINATION REGION BY UNIFORM ILLUMINANCE AND REGISTERING LIGHT INTENSITY GRAVITY CENTER OF LIGHT RAYS IMPINGING ON ILLUMINATION REGION WITH CENTER OF LIGHT RAYS

摘要

PURPOSE: An illumination system, a projection exposure apparatus, and a device manufacturing method are provided to reduce loss of light quantity and shorten exposure time by illuminating an illumination region by uniform illuminance and registering a light intensity gravity center of light rays impinging on the illumination region with a center of light rays. CONSTITUTION: An illumination system(200) includes a first reflection type integrator(230), a first condensing mirror for superposing light beams from the first reflection type integrator one upon another on a surface of an illuminating target, a second reflection type integrator(250) installed between the light source and the first reflection type integrator, and a second condensing mirror for superposing light beams from the second reflection type integrator one upon another on the first reflection type integrator. The first reflection type integrator has a reflection surface including a plurality of cylindrical surfaces, which are disposed substantially in parallel to each other.