METHOD OF FORMING CARBON-NANO-MATERIAL LAYER USING ACYCLIC DEPOSITION TECHNIQUE FOR PREVENTING GENERATION OF PARTICLES BY LOWERING SUBSTRATE TEMPERATURE FOR FORMING CARBON-NANO-MATERIAL LAYER

摘要

PURPOSE: A method of forming a carbon-nano-material layer using an acyclic deposition technique is provided to prevent generation of particles by lowering a substrate temperature for forming the carbon-nano-material layer. CONSTITUTION: A chemical absorption layer containing carbon atoms is formed on a substrate within a reactor by supplying a raw gas into the reactor. A reaction gas is supplied to the reactor in order to remove the remaining atoms except for the carbon atoms from the chemical absorption layer. A carbon atomic layer is formed on the substrate by removing the remaining atoms except for the carbon atoms from the chemical absorption layer.