首页> 外国专利> Optical imaging device designing method, involves optimizing free parameter of mathematical model when value of basis function, that indicates wave front aberration of lens, exceeds its upper limit, where model is used for designing lens

Optical imaging device designing method, involves optimizing free parameter of mathematical model when value of basis function, that indicates wave front aberration of lens, exceeds its upper limit, where model is used for designing lens

机译:光学成像装置的设计方法,涉及当表示透镜的波前像差的基函数值超过其上限时,对数学模型的自由参数进行优化的方法,其中,模型用于设计透镜

摘要

The method involves determining characteristics of an imaging device and computing wave front aberration of a lens of the device from the characteristics based on a mathematical model. The aberration is indicated as a basis function weighted by Zernike coefficients. The model includes a free parameter that is optimized when a value of the function exceeds its upper limit. The model with optimized values is used for designing the lens. The free parameter includes refractive index of a lens of the device, thickness of the lens in the middle and radii of curvature of the lens. An independent claim is also included for an optical imaging device.
机译:该方法包括确定成像装置的特性,并基于数学模型从该特性计算该装置的透镜的波前像差。像差被表示为通过泽尼克系数加权的基函数。该模型包含一个自由参数,该自由参数在函数的值超过其上限时会进行优化。具有优化值的模型用于设计镜头。自由参数包括装置的透镜的折射率,在中间的透镜的厚度和透镜的曲率半径。对于光学成像装置也包括独立权利要求。

著录项

  • 公开/公告号DE102004006262A1

    专利类型

  • 公开/公告日2005-09-01

    原文格式PDF

  • 申请/专利权人 INFINEON TECHNOLOGIES AG;

    申请/专利号DE20041006262

  • 发明设计人 HENKE WOLFGANG;

    申请日2004-02-09

  • 分类号G06F17/10;G02B3/00;G02B9/00;G03F7/20;

  • 国家 DE

  • 入库时间 2022-08-21 22:00:53

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