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Toxic gas pumping and treating system for use in semiconductor fabrication industry, has pumped gas treatment system with plasma sources for generating plasma that decomposes partly some gas traversing pumping assembly
Toxic gas pumping and treating system for use in semiconductor fabrication industry, has pumped gas treatment system with plasma sources for generating plasma that decomposes partly some gas traversing pumping assembly
The system includes a pumping assembly (2) with a vacuum pump body having multiple pumping stages (5-9), and a pumped gas treatment system. The pumped gas treatment system has plasma sources (15, 16) housed inside the vacuum pump body of the pumping assembly for generating plasma that decomposes partly some gas traversing the pumping assembly.
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