首页> 外国专利> METHOD FOR PRODUCING SILICON CARBIDE SINGLE CRYSTAL AND SILICON CARBIDE SINGLE CRYSTAL GROWN BY THE METHOD, SINGLE CRYSTAL INGOT AND SILICON CARBIDE SINGLE CRYSTAL WAFER

METHOD FOR PRODUCING SILICON CARBIDE SINGLE CRYSTAL AND SILICON CARBIDE SINGLE CRYSTAL GROWN BY THE METHOD, SINGLE CRYSTAL INGOT AND SILICON CARBIDE SINGLE CRYSTAL WAFER

机译:用该方法,单晶锭和硅碳化物单晶晶片生产碳化硅单晶和碳化硅单晶

摘要

PROBLEM TO BE SOLVED: To provide a method for stably growing a large-diameter silicon carbide single crystal with few crystal defects.;SOLUTION: A membrane crystal formed on a silicon carbide substrate which is used as a seed is grown. Preferably, the membrane crystal is composed of a single crystal epitaxial growth layer.;COPYRIGHT: (C)2006,JPO&NCIPI
机译:解决的问题:提供一种稳定地生长具有很少晶体缺陷的大直径碳化硅单晶的方法。解决方案:生长在用作种子的碳化硅衬底上形成的膜晶体。优选地,膜晶体由单晶外延生长层组成。;版权所有:(C)2006,JPO&NCIPI

著录项

  • 公开/公告号JP2006117512A

    专利类型

  • 公开/公告日2006-05-11

    原文格式PDF

  • 申请/专利权人 SHOWA DENKO KK;

    申请/专利号JP20050269311

  • 申请日2005-09-16

  • 分类号C30B29/36;C30B23/02;C30B23/06;H01L21/02;H01L21/205;

  • 国家 JP

  • 入库时间 2022-08-21 21:56:42

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