EXFOLIATING LIQUID FOR MULTISTAGE TREATMENT AND METHOD FOR EXFOLIATING ETCHING RESIDUAL SUBSTANCE USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide an exfoliating liquid for a multistage treatment, with which an exfoliating treatment of etching residual substances formed in a wiring structure forming process of a display panel of a semiconductor multilayered wiring structure, a liquid crystal panel, or the like, is safely carried out without lowering the exfoliating performance in comparison with a conventional exfoliating liquid.;SOLUTION: When the etching residual substances are exfoliated, as the exfoliating liquid, at least two liquids of an exfoliating agent having a dissolving property to titanium and a titanium compound and an exfoliating agent containing at least a quaternary ammonium hydroxide are used in a multistage manner.;COPYRIGHT: (C)2006,JPO&NCIPI