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SURFACE PROCESSING METHOD OF AlN CRYSTAL, AlN CRYSTAL SUBSTRATE, THE AlN CRYSTAL SUBSTRATE WITH EPITAXIAL LAYER, AND SEMICONDUCTOR DEVICE
SURFACE PROCESSING METHOD OF AlN CRYSTAL, AlN CRYSTAL SUBSTRATE, THE AlN CRYSTAL SUBSTRATE WITH EPITAXIAL LAYER, AND SEMICONDUCTOR DEVICE
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机译:AlN晶体,AlN晶体基质,具有磊晶层的AlN晶体基质和半导体装置的表面处理方法
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摘要
PROBLEM TO BE SOLVED: To provide a surface processing method of AlN crystal for efficiently forming a surface of proper morphology in an AlN crystal.;SOLUTION: In the surface processing method of AlN crystal, for polishing the surface of AlN crystal 1 chemically and mechanically, slurry 17 that is used in chemical mechanical polishing, contains abrasive grains having hardness higher than that of the AlN crystal 1 and abrasive grains having hardness not higher than that of the AlN crystal 1. The volume ratio of high-hardness abrasive grains to low-hardness abrasive grains in the abrasive grains 16 of the slurry 17 can be set to be in a range of 5:95-70:30.;COPYRIGHT: (C)2006,JPO&NCIPI
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