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Compositions including perhydro-polysilazane used in a semiconductor manufacturing process and methods of manufacturing semiconductor devices using the same

机译:用于半导体制造工艺中的包括全氢聚硅氮烷的组合物以及使用该组合物的半导体器件的制造方法

摘要

Compositions that can be used in semiconductor manufacturing processes, comprising perhydro-polysilazane having a weight average molecular weight of about 300 to about 3,000 and a polydispersity index of about 1.8 to about 3.0 are provided. Solutions comprising the compositions of the present invention, methods of forming films in a semiconductor manufacturing process, and methods of manufacturing semiconductor devices are also provided.
机译:提供了可用于半导体制造工艺中的组合物,其包含重均分子量为约300至约3,000且多分散指数为约1.8至约3.0的全氢聚硅氮烷。还提供了包含本发明的组合物的溶液,在半导体制造过程中形成膜的方法以及制造半导体器件的方法。

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