Electron beam apparatus, a pattern evaluation method and a device manufacturing method using the electron beam apparatus or pattern evaluation method

摘要

Provided is an electron beam apparatus in which an electron beam emitted from an electron gun is separated by a plurality of apertures, images of said apertures are reduced in more than two stages to form multi-beams on a sample surface and to scan said sample thereby, and secondary electrons from said sample are passed through an objective lens, where distances between said secondary electrons are extended, further through an E×B separator, where said secondary electrons are separated from the primary beam, and finally onto secondary electron detectors, where said secondary electrons are detected, wherein a lens defined in the second step for reducing said image of the aperture is composed of two stage lens and an enlarged image of the secondary electron is formed on a position between a first and a second lenses of said two stage lens, thereby reducing an aberration of the optical system for detecting the secondary electrons and allowing as many multi-beams as possible to be formed in the vicinity of a single optical axis.