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MAGNETIC SEMICONDUCTOR MATERIAL AND METHOD FOR PREPARATION THEREOF

机译:磁性半导体材料及其制备方法

摘要

A magnetic semiconductor material having magnetization characteristics and a method for preparing the same is provided. In the method for preparing the magnetic semiconductor, Mn is vapor-deposited at a thickness of 200 to 300 ANGSTROM onto a CdGeP2 single crystal (2) while the CdGeP2 single crystal (2) is maintained at a temperature of about 390 DEG C in a molecular beam epitaxy apparatus (1). The Mn-deposited CdGeP2 single crystal is heated at a temperature of about 510 DEG C for 1 hour. Thus, a magnetic semiconductor comprising CdMnGeP2 and having magnetization characteristics at room temperature is prepared. IMAGE
机译:提供了具有磁化特性的磁性半导体材料及其制备方法。在制备磁性半导体的方法中,将Mn以200至300的厚度气相沉积到CdGeP2单晶(2)上,同时将CdGeP2单晶(2)在约390℃的温度下保持在200℃。分子束外延装置(1)。将Mn沉积的CdGeP2单晶在约510℃的温度下加热1小时。因此,制备了包含CdMnGeP 2并在室温下具有磁化特性的磁性半导体。 <图像>

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