首页> 外国专利> FACED TARGET SPUTTERING DEVICE AND METHOD OF FABRICATING OLED BY USING THE SAME

FACED TARGET SPUTTERING DEVICE AND METHOD OF FABRICATING OLED BY USING THE SAME

机译:面状目标溅射装置及使用该方法制造OLED的方法

摘要

The present invention is by using a target of the opposite disk-shaped, particles having high energy are generated when forming the thin film and prevent damage to the film due to the collision of the substrate, by forming a thin layer by a number of revolution of the substrate opposite to the periphery of the target of the original plate, according to the production method of an organic light emitting display device using the sputtering device suitable for mass production, and this that, with the present invention the opposing target type sputtering apparatus that make up the body of the chamber, the chamber having a substrate mount for mounting a plurality of substrates along the inner wall of the chamber, are oppositely disposed with a predetermined distance to space constraint and a pair of opposing sputtering target for forming the one installed on each of the rear pair of the target is achieved by having a magnetic field generating means for generating a magnetic field to the space constraint.
机译:本发明是通过使用相反的圆盘状的靶,在形成薄膜时产生具有高能量的粒子,并且通过多次旋转形成薄层,从而防止由于基板的碰撞而对薄膜造成损坏。根据使用适合于批量生产的溅射装置的有机发光显示装置的制造方法,在与原板的靶的周缘相对的基板上制造适合于批量生产的有机发光显示装置。构成腔室主体的腔室具有用于沿腔室的内壁安装多个基板的基板安装座,该腔室以预定的距离相对于空间限制地相对设置,并且一对相对的溅射靶用于形成一个通过具有用于向水疗中心产生磁场的磁场产生装置来实现安装在目标的后部对中的每对上ce约束。

著录项

  • 公开/公告号KR20060057255A

    专利类型

  • 公开/公告日2006-05-26

    原文格式PDF

  • 申请/专利权人 SAMSUNG SDI CO. LTD.;

    申请/专利号KR20040096346

  • 发明设计人 LEE KYU SUNG;KIM HAN KI;

    申请日2004-11-23

  • 分类号H05B33/10;

  • 国家 KR

  • 入库时间 2022-08-21 21:25:38

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号