Target for transparent conductive thin film, Transparent conductive thin film and Manufacturing method thereof, Electrode material for display, and Organic electroluminescence element and solar Cell

摘要

The present invention has excellent surface smoothness, the resistivity (比抵抗) is 6.0 × 10 ^-4 or less Ω㎝ low and, even in a heated state of 170 ℃ by not processing the characteristics of the surface smoothness and the specific resistance not changed at all, the transmittance to provide a high transparent conductive thin film, the technical means is such that the oxide thin film after sputter and indium oxide as the main component, contained in a proportion of 0.0040 to 0.0470, tungsten and / or molybdenum as a (W + Mo) / in atomic ratio in combination, forming the indium powder and tungsten oxide powder, by using a target (target) is obtained by heating and sintering the molded body and, while maintaining the substrate below 120 ℃ composed of the amorphous phase on a substrate by sputtering the transparent conductive thin film It is a gain.