首页> 外国专利> FABRICATION OF A FAST- SWITCHING THYRISTOR BY PROTON IRRADIATION- A SMART MINORITY CARRIER LIFETIME CONTROL METHOD

FABRICATION OF A FAST- SWITCHING THYRISTOR BY PROTON IRRADIATION- A SMART MINORITY CARRIER LIFETIME CONTROL METHOD

机译:质子辐照制造快速开关晶闸管-一种智能少数载流子寿命控制方法

摘要

The invention particularly relates to a method for manufacturing a power semiconductor device, for forming the cathode of the power semiconductor device metallization pattern, but the process is proceeding as yangseongjaseon irradiation process for the heat treatment process prior to carrier lifetime control in the end state, in the first step to set the magnetic lens is irradiated through the irradiation energy quantization acceleration system to 4.7MeV; A second step of such vertically incident on the cathode surface of the semiconductor device according to the accelerated proton beam acceleration energy level quantization been set in the first step; And wherein when the second acceleration step the proton beam irradiation is completed through a certain heat environment for a predetermined time in the proton characterized in that it comprises a third step of heat treatment irradiation method according to the high-voltage / high-current semiconductor-switching element for making a small number of high-speed By providing a carrier lifetime control method, in the case of proton acceleration energy is 4.7MeV the best forward voltage (on-state voltage drop V TM ) drop-off time (turn-off time t q ) trade-off in accordance with the shows the relationship V TM , while only just seen the deterioration of 6.9% compared to prior research t q Joe in advance 80 the effect is improved significantly in 15 .
机译:本发明特别涉及一种用于制造功率半导体器件的方法,用于形成功率半导体器件金属化图案的阴极,但是该工艺作为梁城强子辐照工艺进行,用于在最终状态下进行载流子寿命控制之前的热处理工艺,第一步,通过辐照能量量化加速系统将磁透镜辐照至4.7MeV;在第一步中设置了根据加速的质子束加速能级量化使这种垂直入射在半导体器件的阴极表面上的第二步。并且其中,当第二加速步骤中,质子束辐射通过质子在特定的加热环境中完成预定时间后,其特征在于,该步骤包括根据高压/高电流半导体的热处理辐射方法的第三步骤,通过提供载流子寿命控制方法,在质子加速能量为4.7MeV的情况下,最佳正向电压(通态电压降V TM )降低关断时间(关闭时间t q )根据关系V TM 进行权衡,而与之前相比仅下降了6.9%研究t q Joe预先在80中改善了效果15。

著录项

  • 公开/公告号KR100616115B1

    专利类型

  • 公开/公告日2006-08-18

    原文格式PDF

  • 申请/专利权人 SEMIWELL SEMICONDUCTOR CO. LTD.;

    申请/专利号KR20050080418

  • 发明设计人 C.L. ZHANG;

    申请日2005-08-31

  • 分类号H01L29/40;

  • 国家 KR

  • 入库时间 2022-08-21 21:23:11

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