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Substrate plasma conditioning device, has low-temperature plasma with two linear electrodes that are arranged on side of substrate, where electrodes are connected with two connecting terminals of high frequency generator unit
Substrate plasma conditioning device, has low-temperature plasma with two linear electrodes that are arranged on side of substrate, where electrodes are connected with two connecting terminals of high frequency generator unit
The device has a low-temperature plasma, consisting of two linear electrodes (1), which are arranged on a side of a substrate (3). The length of the plasma corresponds to its middle distance. The electrodes are connected with two connecting terminals (6) of a high frequency generator unit and housing of source of plasma. The housing shields the side of the electrodes that is turned away and exposed to the substrate. An independent claim is also included for a method for operating a device for plasma conditioning a substrate.
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