首页>
外国专利>
Dose control for correction of the lines of the wide change along the scanning direction
Dose control for correction of the lines of the wide change along the scanning direction
展开▼
机译:剂量控制,用于校正沿扫描方向变化的线条
展开▼
页面导航
摘要
著录项
相似文献
摘要
In a scanning photolithographic device used in the manufacture of semiconductors, a method and apparatus for varying the exposure dose as a function of distance in the scan direction compensating for the signature of the photolithographic device for reducing linewidth variation in the scan direction. The linewidth in the scan direction may vary for a particular device or tool for a variety of reasons. This variation or signature is used in combination with a photosensitive resist response function to vary the exposure dose as a function of distance in a scan direction, substantially reducing the linewidth variation. A dose control varies the exposure dose as a function of distance in a scan direction to correct linewidth variations caused by characteristics of the photolithographic system. Linewidth variations as a function of distance in the direction of scan are substantially reduced, resulting in more consistent and improved feature or element sizes.
展开▼