MANUFACTURING METHOD OF SPUTTERING TARGET FOR FORMING PROTECTIVE FILM OF PHASE TRANSITION TYPE OPTICAL DISK, AND OPTICAL RECORDING MEDIUM WITH THE PROTECTIVE FILM OF PHASE TRANSITION TYPE OPTICAL DISK FORMED BY USING THE TARGET MANUFACTURED BY THE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To obtain a sputtering target comprising a composite of a chalcogenide and a silicate, which ensures suppression of generation of a nodule, high uniformity of film-deposition and high manufacturing efficiency and is useful for forming a protective film of a phase transition type optical disk; and to provide an optical recording medium with the protective film of the phase transition type optical disk formed by using the target.;SOLUTION: The sputtering target for forming the phase transition type optical disk protective film comprising the composite of the chalcogenide and the silicate has a texture wherein 0.3A/B0.95 is satisfied when an average length in the normal direction and an average length in the vertical direction to the normal of the silicate existing on a surface in the range of -30 to +30 to the normal direction of a sputtering surface in at least an erosion part are denoted as A and B, respectively.;COPYRIGHT: (C)2007,JPO&INPIT