In the playback methodological null photoresist exfoliation process control method of photoresist exfoliation process control method and the photoresist

摘要

Although photoresist layer is exfoliated in the method of controlling the photoresist exfoliation process in order to produce the semiconductor device or the Liquid Crystal Display element, constitution of the exfoliation liquid which is used it is analyzed first making use of the NIR spectroscope. State of the exfoliation liquid is judged by comparing constitution and the standard constitution which were analyzed. When life of the exfoliation liquid ends the aforementioned exfoliation liquid is exchanged in the new exfoliation liquid, so the aforementioned exfoliation liquid is transported to the next photoresist exfoliation process when is not. This analysis technology resemblance at system can be applied to photoresist exfoliation liquid playback process. Selective figure Figure 1