Inside the vacuum container where the base substance which should form the production manner of the functional

摘要

PROBLEM TO BE SOLVED: To obtain the manufacturing method of a functional deposited film, which suppresses characteristic unevenness of the deposited film, and a manufacturing apparatus for the functional deposited film.;SOLUTION: A deposited film manufacturing device 10 has a grounding electrode 7, which is mounted with a substrate 8 to be formed with a deposited film and is connected with the ground, and a cathode 6, which is applied with high-frequency power from an external high-frequency power supply 5 and is arranged counterposed to the electrode 7, in a reaction vessel 9 and the device 10 is provided with a first gas feeding path 1, which introduces a gas which is used as the raw material for the deposited film, from the outside into the container 9 and consists of a plurality of gas pipes, and a second gas feeding path 2. The paths 1 and 2 are respectively provided with a first gas flow rate control part 1a and a second gas flow rate control part 2a, and while the parts 1a and 2a respectively give independently a 'fluctuations' to the flow rate of the gas, they control the flow rate of the gas. Moreover, an exhaust unit, not shown, is connected with the container 9 for setting the interior of the container 9 into a desired vacuum pressure level.;COPYRIGHT: (C)2001,JPO