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Composition for forming a transparent conducting film, solution for forming a transparent conducting film and method of forming a transparent conducting film

机译:用于形成透明导电膜的组合物,用于形成透明导电膜的溶液和形成透明导电膜的方法

摘要

The composition of the present invention is one for forming a transparent conducting film, the composition comprising a water-soluble indium compound, a halogen-containing water-soluble organotin compound and a water-soluble organic high molecular compound. A method for forming a transparent conducting film according to the invention comprises the steps of i) applying to a substrate a solution for forming a transparent conducting film containing the composition in water or a solvent comprising water and an organic solvent, and ii) firing the coating film. This method may further include iii) the step of subjecting the film obtained in the firing step ii) to a reducing heat treatment.
机译:本发明的组合物是用于形成透明导电膜的组合物,该组合物包含水溶性铟化合物,含卤素的水溶性有机锡化合物和水溶性有机高分子化合物。根据本发明的用于形成透明导电膜的方法包括以下步骤:i)将用于形成透明导电膜的溶液施加到基板上,所述溶液包含在水中或包含水和有机溶剂的溶剂中的组合物,以及ii)烧制所述透明导电膜。涂膜。该方法可以进一步包括iii)对在烧制步骤ii)中获得的膜进行还原热处理的步骤。

著录项

  • 公开/公告号US7147805B2

    专利类型

  • 公开/公告日2006-12-12

    原文格式PDF

  • 申请/专利权人 TAKASHI MIYOSHI;

    申请/专利号US20030602906

  • 发明设计人 TAKASHI MIYOSHI;

    申请日2003-06-24

  • 分类号H01B1/02;B05D5/12;B05D3/02;

  • 国家 US

  • 入库时间 2022-08-21 21:01:32

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