BRUSH SESNING APPARATUS FOR WAFER CLEANING APPARATUS AND BRUSH SESNING METHOD THE SAME

摘要

A brush detecting device of a wafer cleaning apparatus and a brush detecting method using the same are provided to perform smoothly a cleaning process and to improve the reliability and productivity of semiconductor devices by checking easily a loading state of a brush in real time using light emitting and receiving sensors. A brush detecting device of a wafer cleaning apparatus includes a light emitting sensor, a light receiving sensor and a controller. The light emitting sensor(106a) is installed at one side of a brush storing unit(104), wherein the brush storing unit is used for storing a wafer cleaning brush mounted on a brush driving shaft(100). The light emitting sensor is used for irradiating light through the brush storing unit. The light receiving sensor(106b) is installed at the other side of the brush storing unit. The light receiving sensor is used for receiving the light supplied from the light emitting sensor. The controller is connected with the light emitting and receiving sensors to determine a loading state of the brush according to the predetermined signal supplied from the light emitting and receiving sensors.