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POWDER REMOVING DEVICE OF SCRUBBER FOR PROCESSING SEMICONDUCTOR BY-PRODUCT GAS

机译:用于处理半导体副产物气体的洗涤粉的粉末去除装置

摘要

A powder removing apparatus of a scrubber for processing a semiconductor byproduct gas is provided to prevent various powders from being deposited on an inner wall of a combustion chamber by supplying a gas pulse wave with a predetermined pressure onto the inner wall of the combustion chamber using a powder removing gas supply unit. A scrubber for processing a semiconductor byproduct gas includes a burner(120) for receiving the byproduct gas generated from a semiconductor manufacturing process and performing a combustion process on the byproduct gas, a combustion chamber, and a powder removing apparatus. The combustion chamber(130) is connected with the burner. Various powders generated from the combustion process fall in the combustion chamber. The powder removing apparatus prevents the various powders from being deposited on an inner wall of the combustion chamber by supplying a predetermined gas endowed with pressure onto the inner wall of the combustion chamber. The powder removing apparatus includes a power removing gas supply unit(170).
机译:提供一种用于处理半导体副产物气体的洗涤器的除粉装置,以通过使用预定压力将具有预定压力的气体脉冲波供应到燃烧室的内壁上来防止各种粉末沉积在燃烧室的内壁上。除粉气供应单元。用于处理半导体副产物气体的洗涤器包括燃烧器(120),燃烧室和除粉装置,该燃烧器用于接收从半导体制造过程产生的副产物气体并对副产物气体进行燃烧过程。燃烧室(130)与燃烧器连接。由燃烧过程产生的各种粉末落入燃烧室。粉末去除设备通过将赋予压力的预定气体供应到燃烧室的内壁上来防止各种粉末沉积在燃烧室的内壁上。粉末去除装置包括功率去除气体供应单元(170)。

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