首页> 外国专利> PHOTOMASK FOR FABRICATING BARRIER RIB OF PDP AND METHOD OF FABRICATING PDP USING THE PHOTOMASK

PHOTOMASK FOR FABRICATING BARRIER RIB OF PDP AND METHOD OF FABRICATING PDP USING THE PHOTOMASK

机译:PDP的障壁肋骨的光掩模以及使用该光掩模制造PDP的方法

摘要

A photomask for manufacturing a barrier rib of a PDP(Plasma Display Panel) and a method of manufacturing the PDP using the photomask are provided to increase the size of a discharge cell by arranging an auxiliary pattern on a corner of a main pattern. A barrier rib film(113) is formed on a substrate(110). A photoresist layer(117) is formed on the barrier rib film. The photoresist layer is exposed to light by using an exposure mask, which includes plural optical transmittance adjusting patterns. The optical transmittance adjusting pattern contains a main pattern and an auxiliary pattern, which is formed on a corner of the main pattern. An aperture(117p) for exposing the barrier rib film is formed inside the photoresist layer. The exposed barrier rib film is etched by using the photoresist layer as an etching mask such that a barrier rib for defining discharge cells is formed.
机译:提供用于制造PDP(等离子显示面板)的障壁的光掩模和使用该光掩模的PDP的制造方法,以通过在主图案的角部上布置辅助图案来增加放电室的尺寸。在基板(110)上形成有隔壁膜(113)。在阻挡肋膜上形成光致抗蚀剂层(117)。通过使用包括多个光学透射率调节图案的曝光掩模将光致抗蚀剂层曝光。透光率调节图案包括主图案和形成在主图案的角上的辅助图案。在光致抗蚀剂层的内部形成有用于使障壁膜露出的开口(117p)。通过使用光致抗蚀剂层作为蚀刻掩模来蚀刻暴露的障壁膜,从而形成用于限定放电室的障壁。

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