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PHOTOMASK FOR FABRICATING BARRIER RIB OF PDP AND METHOD OF FABRICATING PDP USING THE PHOTOMASK
PHOTOMASK FOR FABRICATING BARRIER RIB OF PDP AND METHOD OF FABRICATING PDP USING THE PHOTOMASK
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机译:PDP的障壁肋骨的光掩模以及使用该光掩模制造PDP的方法
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摘要
A photomask for manufacturing a barrier rib of a PDP(Plasma Display Panel) and a method of manufacturing the PDP using the photomask are provided to increase the size of a discharge cell by arranging an auxiliary pattern on a corner of a main pattern. A barrier rib film(113) is formed on a substrate(110). A photoresist layer(117) is formed on the barrier rib film. The photoresist layer is exposed to light by using an exposure mask, which includes plural optical transmittance adjusting patterns. The optical transmittance adjusting pattern contains a main pattern and an auxiliary pattern, which is formed on a corner of the main pattern. An aperture(117p) for exposing the barrier rib film is formed inside the photoresist layer. The exposed barrier rib film is etched by using the photoresist layer as an etching mask such that a barrier rib for defining discharge cells is formed.
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