Plasma CVD coating, is formed by locating the component to be coated in a vacuum chamber, evacuating the chamber, supplying a process gas, and creating a plasma

摘要

Plasma CVD coating curved surfaces with a dielectric comprises locating the substrate to be coated in a vacuum chamber, evacuating the chamber, feeding a process gas into the chamber, and forming a plasma by coupling electromagnetic radiation to the chamber. The radiation wavelength lies near the RF region. The process gas contains at least one monomer.