首页> 外国专利> Radiation punctiform focusing device for use in beam shaping optics, has interface defined by solution of system of equations, and optical medium whose refractive index differs from refractive index of materials

Radiation punctiform focusing device for use in beam shaping optics, has interface defined by solution of system of equations, and optical medium whose refractive index differs from refractive index of materials

机译:用于光束整形光学器件的辐射点状聚焦装置,具有由方程组求解确定的界面,以及折射率与材料折射率不同的光学介质

摘要

The device has an optical medium arranged along an optical axis behind an optical interface (S2). A light emitting surface and the interface are arranged in a paraxial distance to each other, and the interface and a pixel unit (PB) are arranged in another paraxial distance to one another. The interface is defined by solution of system of equations,. A refractive index (n1) of the medium differs from a refractive index (n2) of materials arranged between a rib waveguide (12) and the interface.
机译:该设备具有沿光轴布置在光学接口后面的光学介质(S2)。发光表面和界面以彼此的近轴距离布置,并且界面和像素单元(PB)以彼此的近轴距离布置。该接口由方程组的解定义。介质的折射率(n1)不同于布置在肋状波导(12)和界面之间的材料的折射率(n2)。

著录项

  • 公开/公告号DE102006027126B3

    专利类型

  • 公开/公告日2007-10-11

    原文格式PDF

  • 申请/专利权人 FORSCHUNGSVERBUND BERLIN E.V.;

    申请/专利号DE20061027126

  • 发明设计人 GUETHER REINER;ERBERT GOETZ;

    申请日2006-06-02

  • 分类号G02B6/32;

  • 国家 DE

  • 入库时间 2022-08-21 20:29:16

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