首页> 外国专利> Production of silicon semiconductor crystals by floating zone process with seeding, core zone growth and main zone growth, involves changing pressure in growth chamber during process

Production of silicon semiconductor crystals by floating zone process with seeding, core zone growth and main zone growth, involves changing pressure in growth chamber during process

机译:通过具有种子,核心区生长和主区生长的浮区工艺生产硅半导体晶体,涉及在工艺期间改变生长室中的压力

摘要

The production of silicon semiconductor crystals (I) by the floating zone process comprises: (a) melting a silicon block; (b) fusing the block on a seed crystal; (c) growing a core zone and increasing its diameter in a chamber; and (d) growing a straight main zone while regulating its diameter to a required value, in which a pressure in the chamber is changed during the growth of the crystal.
机译:通过浮区法生产硅半导体晶体(I)包括:(a)熔化硅块; (b)将块熔化在籽晶上; (c)扩大核心区并在室内增加其直径; (d)生长直的主要区域,同时将其直径调节至所需值,其中在晶体生长期间改变腔室中的压力。

著录项

  • 公开/公告号DE102006055376A1

    专利类型

  • 公开/公告日2007-05-31

    原文格式PDF

  • 申请/专利权人 SHIN-ETSU HANDOTAI CO. LTD.;

    申请/专利号DE20061055376

  • 发明设计人 KODAMA YOSHIHIRO;

    申请日2006-11-23

  • 分类号C30B13/28;C30B13/20;H01L21/208;

  • 国家 DE

  • 入库时间 2022-08-21 20:29:11

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号