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Reactive plating, has flat effective body centrifugable against approaching projectile by using electrical flat coil accelerator, where front plates are integrated as electrical contact sensor in circuit of accelerator
Reactive plating, has flat effective body centrifugable against approaching projectile by using electrical flat coil accelerator, where front plates are integrated as electrical contact sensor in circuit of accelerator
The plating has an electrical flat coil accelerator (5) arranged on a main plating (4), and a flat effective body (3) centrifugable against approaching projectile (7) by using the accelerator. Front plates (1, 2) are arranged at a distance to the main plating and the accelerator, where the front plates are integrated as an electrical contact sensor in a circuit of the accelerator. A material e.g. glass, for formation of plasma is provided between the front plates.
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