DEFECT DETECTION METHOD AND DEFECT DETECTION DEVICE FOR GRAY TONE MASK, DEFECT DETECTION METHOD FOR PHOTOMASK, METHOD FOR MANUFACTURING GRAY TONE MASK, AND PATTERN TRANSFER METHOD

摘要

PPROBLEM TO BE SOLVED: To provide a defect detection method for a gray tone mask, the method capable of accurately judging the presence or absence of a defect in a semitransmitting part of a gray tone mask having a region where a fine pattern is formed, the fine pattern less than the resolution limit under the exposure conditions when the mask is used, and capable of improving the reliability of defect inspection. PSOLUTION: The defect detecting method for a gray tone mask is provided, the mask having a light shielding part, a light transmitting part and a light semitransmitting part, and including a region where a fine light-shielding pattern less than the resolution limit under the exposure conditions upon exposing the mask is formed, in the semitransmitting part. The method includes: a step of scanning the light semitransmitting part to obtain a transmittance signal; and a judging step of judging the presence or absence of a defect in the semitransmitting part by comparing the transmittance signal to the preliminarily determined transmittance allowance in the semitransmitting part. In the step of obtaining the transmittance signal, the semitransmitting part is irradiated with light from a predetermined light source; an image defocused in a predetermined amount from the just-focus position formed by the transmitted beam through the semitransmitting part is photographed by an imaging means; and the transmittance signal is obtained from the photographed image. PCOPYRIGHT: (C)2008,JPO&INPIT