In the production manner due to the DC magnetron sputtering modulo of the photo mask blank which possesses the thin film

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a phase shift mask blank which can reduce variances in phase angle and transmissivity between blanks as much as possible and has a good yield.;SOLUTION: The method for manufacturing a photomask blank having a thin film for forming at least a pattern on a transparent substrate is characterized in that the thin film is formed by sputtering a target facing the position to which the center axis of the substrate shifts while the substrate is rotated.;COPYRIGHT: (C)2004,JPO