Patterning method, and the self organization material patterning baseplate and that production method of the self organization material, and the photo mask which uses the self organization material patterning baseplate

摘要

Making use of imprint process, as intended the self organization material which possesses the self organization talent of nuclear acid and the like, it arranges on the baseplate, patterning method of the self organization material which makes that it fixes possible, it offers the self organization material patterning baseplate and its production method, and photo mask. It forms the fixation layer which includes the connection talent substance which possesses the connection talent of the self organization material on the baseplate, patterning it does the said fixation layer by the fact that the unevenness pattern which was formed to mold is copied at imprint process, supplies the above-mentioned self organization material to the unevenness pattern copying aspect of the said fixation layer, it fixes the said self organization material, with itself self organization talent and the connection talent of the above-mentioned connection talent substance which is included in the above-mentioned fixation layer according to the unevenness pattern of the above-mentioned fixation layer.