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Electron beam position fluctuation measuring method, electron beam position fluctuation measurement equipment and electron beam recording device

机译:电子束位置变动测量方法,电子束位置变动测量设备和电子束记录装置

摘要

Preceding the record of the electron beam recording device, at the time of the measurement of the beam position fluctuation which is done, at the same time stability measurement of the accurate fluctuation quantity is made possible. Preceding record, the measurement equipment 10 which measures the position fluctuation of electron beam E P, the knife edge 11 which is arranged in lighting position of beam spot E P and through the knife edge 11, in order for the center of beam spot E P to become advanced position of the knife edge 11 on the basis of the output of filter expedient (high pass cut-off filter 14 and the like) and this filter expedient which remove the fluctuation frequency component of the measuring object from output of detection expedient (Faraday cup 12 and the like) and this detection expedient which detect the electron beam E which is irradiated, the control means which control the standard position of electron beam EIt has with 15, the case where the center of beam spot E P slips from the point of the knife edge 11 it measures the position fluctuation of beam spot E P due to the output change of detection expedient.
机译:在进行电子束记录装置的记录之前,在进行束位置波动的测量时,同时使得可以进行准确波动量的稳定性测量。在此之前的记录中,测量设备10测量电子束E P 的位置波动,刀刃11布置在束斑E P 的发光位置并通过刀刃11,以使光束斑E P 的中心基于滤波器的权宜之计(高通截止滤波器14等)的输出而成为刀刃11的进给位置。 ),从检测手段(法拉第杯12等)的输出中去除被测定物的变动频率成分的该滤波器手段,以及检测被照射的电子束E的该手段,控制基准位置的控制单元。的电子束EIt具有15,在电子束斑E P 的中心从刀刃11的点滑落的情况下,它测量电子束斑E P 由于检测权宜的输出变化。

著录项

  • 公开/公告号JPWO2005121902A1

    专利类型

  • 公开/公告日2008-04-10

    原文格式PDF

  • 申请/专利权人 パイオニア株式会社;

    申请/专利号JP20060514470

  • 发明设计人 小島 良明;

    申请日2005-06-02

  • 分类号G03F7/20;H01L21/027;G11B7/26;H01J37/04;

  • 国家 JP

  • 入库时间 2022-08-21 20:17:02

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