首页> 外国专利> Process for Preparing Metal or Metal Alloy Nanoparticles Dispersed on a Substrate by Chemical Vapour Deposition

Process for Preparing Metal or Metal Alloy Nanoparticles Dispersed on a Substrate by Chemical Vapour Deposition

机译:通过化学气相沉积制备分散在基质上的金属或金属合金纳米颗粒的方法

摘要

Process of depositing nanoparticles of a metal or of an alloy of said metal, said metal being chosen from the metals from columns VIIIB and IB of the Periodic Table, dispersed on a substrate by chemical vapour deposition (CVD), from one or more precursors, in which the deposition is carried out in the presence of a gas comprising more than 50 vol % of a reactive oxidizing gas.;Substrate comprising at least one surface, dispersed on which are nanoparticles made of a metal or of an alloy of metals, for example made of silver or a silver alloy.;Use of the substrate to catalyse a chemical reaction, for example an NOx elimination reaction.
机译:沉积金属或所述金属的合金的纳米颗粒的方法,所述金属选自元素周期表的VIIIB和IB列的金属,其通过化学气相沉积(CVD)从一种或多种前体分散在基板上,其中,所述沉积在包含大于50体积%的反应性氧化气体的气体的存在下进行。包含至少一个表面的基底,所述表面上分散有由金属或金属合金制成的纳米颗粒,用于例如由银或银合金制成。;使用底物催化化学反应,例如NO x 消除反应。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号