首页> 外国专利> MULTILAYER CAPACITOR STRUCTURE HAVING AN ARRAY OF CONCENTRIC RING-SHAPED PLATES FOR DEEP SUB-MICRON CMOS

MULTILAYER CAPACITOR STRUCTURE HAVING AN ARRAY OF CONCENTRIC RING-SHAPED PLATES FOR DEEP SUB-MICRON CMOS

机译:具有深亚微米CMOS的环形环形状的平板的多层电容器结构

摘要

A capacitor structure having a first and at least a second conductor level of electrically conductive concentric ring-shaped lines. The conductive lines of the first and at least second levels are arranged in concentric ring-shaped stacks. A dielectric material is disposed between the first and second conductor levels and between the concentric conductive lines in each of the levels. At least one electrically conductive via electrically connects the conductive lines in each stack, thereby forming a concentric array of ring-shaped capacitor plates. The concentric array of capacitor plates are electrically connected in an alternating manner to first and second terminals of opposite polarity so that capacitance is generated between adjacent plates of the array. The capacitor structure is especially useful in deep sub-micron CMOS.
机译:一种具有导电同心环形线的第一和至少第二导体级的电容器结构。第一级和至少第二级的导线布置在同心的环形堆叠中。介电材料设置在第一和第二导体层之间以及每个层中的同心导线之间。至少一个导电通孔电连接每个堆叠中的导线,从而形成环形电容器板的同心阵列。电容器板的同心阵列以交替的方式电连接到相反极性的第一和第二端子,从而在阵列的相邻板之间产生电容。电容器结构在深亚微米CMOS中特别有用。

著录项

  • 公开/公告号KR100815172B1

    专利类型

  • 公开/公告日2008-03-19

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20017015519

  • 申请日2001-12-03

  • 分类号H01L27/04;

  • 国家 KR

  • 入库时间 2022-08-21 19:52:20

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