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Method for interferometric determination of deviation of actual shape of effective reflection surface of test object from reference shape of effective reflection surface, involves producing electromagnetic light radiation

机译:用干涉法确定测试对象有效反射面实际形状与有效反射面参考形状之间的偏差的方法,涉及产生电磁辐射

摘要

The method involves producing an electromagnetic light radiation (24) by an illuminating device (16), which is provided as input wave (30). The input wave runs through a diffractive optical element (18) and leaves as incoming measuring wave (42). The reflected measuring wave (44) runs through the diffractive optical element and leaves as outgoing measuring wave (46). An intensity distribution of an interference pattern, which is produced by the interference of the reference wave with the outgoing measuring wave is detected by a detection device (20). An independent claim is also included for a device for interferometric determination of a deviation of an actual shape of an effective reflection surface of a test object from a reference shape of the effective reflection surface.
机译:该方法包括通过照明设备(16)产生电磁光辐射(24),该照明设备被提供为输入波(30)。输入波穿过衍射光学元件(18),并作为入射测量波(42)离开。反射的测量波(44)穿过衍射光学元件,并作为出射的测量波(46)离开。由检测装置(20)检测由参考波与射出的测量波的干涉产生的干涉图案的强度分布。还包括一种用于干涉测量确定测试对象的有效反射面的实际形状与有效反射面的参考形状的偏差的装置的独立权利要求。

著录项

  • 公开/公告号DE102006055070A1

    专利类型

  • 公开/公告日2008-06-05

    原文格式PDF

  • 申请/专利权人 CARL ZEISS SMT AG;

    申请/专利号DE20061055070

  • 发明设计人 DOERBAND BERND;

    申请日2006-11-22

  • 分类号G01B9/02;G01B11/24;

  • 国家 DE

  • 入库时间 2022-08-21 19:49:37

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