首页> 外国专利> METHOD FOR SIMULATION BY SIMULATOR FOR OBTAINING ELECTRIC CHARACTERISTICS OF THIN-FILM TRANSISTOR DISPOSED IN CRYSTALLIZED REGION AND PHYSICAL ANALYSIS MODEL FOR CALCULATING AND EXTRACTING COULOMB SCATTERING CENTRAL DENSITY INCLUDED IN CHANNEL REGION OF THIN-FILM TRANSISTOR DISPOSED IN CRYSTALLIZED REGION

METHOD FOR SIMULATION BY SIMULATOR FOR OBTAINING ELECTRIC CHARACTERISTICS OF THIN-FILM TRANSISTOR DISPOSED IN CRYSTALLIZED REGION AND PHYSICAL ANALYSIS MODEL FOR CALCULATING AND EXTRACTING COULOMB SCATTERING CENTRAL DENSITY INCLUDED IN CHANNEL REGION OF THIN-FILM TRANSISTOR DISPOSED IN CRYSTALLIZED REGION

机译:晶体区域中配置的薄膜晶体管的电学特性的仿真器模拟方法以及薄膜晶体管的分布在沟道区域中的库仑散射中心密度的计算和提取的物理分析模型

摘要

PROBLEM TO BE SOLVED: To provide a model for performing physical analysis on a grain boundary determining a mobility by applying a universal plot for Poly-Si TFT.;SOLUTION: The physical analysis model provides for analyzing the mobility μ of Poly-Si TFT. The mobility μ and the Vg-Id characteristic of the TFT are measured and 3 mobilities, Coulomb scattering mobility μ (Coulomb), phonon scattering mobility μ (phonon) and surface roughness scattering μ (surface), and an effective electric field Eeff are calculated from the measured mobility μ and the Vg-Id characteristic of the TFT. The physical analysis model includes a step of obtaining a free carrier density n from the effective electric field Eeff, and a step of obtaining the Coulomb scattering center density N (Coulomb) using the correlation characteristic between the Coulomb scattering mobility μ (Coulomb) and the free carrier density n.;COPYRIGHT: (C)2010,JPO&INPIT
机译:解决的问题:提供一种通过对多晶硅TFT应用通用图来对确定迁移率的晶界进行物理分析的模型。解决方案:物理分析模型用于分析迁移率μ。多晶硅TFT的制造。流动性μ测量TFT的Vg-Id特性和Vg-Id特性,并求出3个迁移率,库仑散射迁移率μ。 (库仑),声子散射迁移率&μ; (声子)和表面粗糙度散射μ; (表面),并根据测得的迁移率μ计算有效电场Eeff。 TFT的Vg-Id特性。物理分析模型包括从有效电场Eeff获得自由载流子密度n的步骤,以及使用库仑散射迁移率μ与μ之间的相关特性来获得库仑散射中心密度N(Coulomb)的步骤。 (库仑)和自由载流子密度n .;版权:(C)2010,JPO&INPIT

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