首页> 外国专利> MANUFACTURING METHOD OF TRANSMISSION TYPE MODERATOR FOR SLOW POSITRON BRIGHTNESS ENHANCEMENT, TRANSMISSION TYPE MODERATOR FOR SLOW POSITRON BRIGHTNESS ENHANCEMENT, BRIGHTNESS ENHANCEMENT METHOD OF SLOW POSITRON BEAM, HIGH BRIGHTNESS SLOW POSITRON BEAM GENERATION DEVICE, AND POSITRON MICROSCOPE

MANUFACTURING METHOD OF TRANSMISSION TYPE MODERATOR FOR SLOW POSITRON BRIGHTNESS ENHANCEMENT, TRANSMISSION TYPE MODERATOR FOR SLOW POSITRON BRIGHTNESS ENHANCEMENT, BRIGHTNESS ENHANCEMENT METHOD OF SLOW POSITRON BEAM, HIGH BRIGHTNESS SLOW POSITRON BEAM GENERATION DEVICE, AND POSITRON MICROSCOPE

机译:慢正电子亮度增强的透射型调节器的制造方法,慢正电子亮度增强的透射型调节器,慢正电子束的亮度增强方法,高亮度慢正电子制造方法,

摘要

PROBLEM TO BE SOLVED: To provide a moderator made of a nickel thin film of a positron brightness enhancement transmission type capable of generating re-discharge positrons with high efficiency higher than 20%.;SOLUTION: (1) A nickel thin film having the thickness of 100-200 nm is heat-treated in a hydrogen gas atmosphere in a range of 700C-800C, and (2) the surface of the nickel thin film is cleaned by making an impact on the heat-treated nickel thin film with hydrogen atoms and/or hydrogen ions generated by subjecting hydrogen gas to electron impact in the hydrogen gas atmosphere wherein a hydrogen gas pressure is higher than 0.001333 Pa (10-5 Torr) and below 0.013332 Pa (10-4 Torr).;COPYRIGHT: (C)2009,JPO&INPIT
机译:要解决的问题:提供一种由正电子增亮透射型的镍薄膜制成的减速剂,它能够以高于20%的效率产生高效率的再放电正电子。解决方案:(1)具有厚度的镍薄膜在氢气气氛中在700C-800C范围内对100-200 nm的镍薄膜进行热处理,并且(2)通过用氢原子对热处理过的镍薄膜产生冲击来清洁镍薄膜的表面和/或通过在氢气压力高于0.001333 Pa(10 -5 Torr)且低于0.013332 Pa(10 -4 Torr).;版权:(C)2009,日本特许厅&INPIT

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