首页>
外国专利>
Using height measurement to save time, a method for projecting repeatedly mask pattern on a substrate and devices
Using height measurement to save time, a method for projecting repeatedly mask pattern on a substrate and devices
展开▼
机译:使用高度测量节省时间的一种在基板和装置上重复投影掩模图案的方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
In a lithographic projection apparatus, a time-saving height measurement method is used. While in a projection station (105,108,111) the pattern of a mask (129) is projected on the fields of a first substrate (120), the height of the fields of a second substrate (121) is measured in a measuring station (133). In the measuring station, the height of the substrate fields and the height of the substrate holder (113) are measured by a first height sensor (150) and a second height sensor (160), respectively, and the value of the height of the substrate holder associated with the ideal height of the substrate field is determined for each substrate field. In the projection station, only the height of the substrate holder (111) is controlled by a third height sensor (180). The second and third height sensors are preferably part of a composite XY interferometer system extended with a Z measuring axis.
展开▼