Topcoat and peelable with water castable with water for 193nm immersion lithography

摘要

I will disclose the top coat material to be applied on top to provide a top coat peelable with water castable in the water for the [challenge] 193nm immersion lithography [MEANS FOR SOLVING PROBLEMS] photoresist material. The top coat material is insoluble to slightly soluble or in water at temperatures at about or below 25 ℃, but includes polymers that are soluble in water at a temperature at or above about 60 ℃. Wherein the monomer units of the polyvinyl alcohol, and monomeric units of polyvinyl ether or polyvinyl acetate, the polymer has the structure shown below. [Formula 1] Wherein, R is an aliphatic or alicyclic group, independently, n and m are integers same or different, p is zero or one. The topcoat material may be used in lithography process for applying over the photoresist layer a topcoat material. The topcoat material is particularly useful in immersion lithography process using an image forming medium of water. The topcoat material of the present invention are also useful in immersion lithography process using immersion liquid organic liquid. [Selection] Figure Figure 1