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Production method of AlGaAs-based semiconductor laser, manufacturing methods and compound semiconductor growth method of AlGaAs-based semiconductor device

机译:AlGaAs基半导体激光器的制造方法,AlGaAs基半导体器件的制造方法和化合物半导体生长方法

摘要

PROBLEM TO BE SOLVED: To provide a method of growing a compound semiconductor which can reduce the reevaporation of In from a growth layer and can get a growth layer favorable in surface morophogy, in the case of growing a compound semiconductor including In and not including Al. ;SOLUTION: In an AlGaAs semiconductor laser which has a distorted quantum well structure of active layer, an Al-doped GaInAs active layer 4 is used as an active layer. The Al-doped GaInAs active layer 4 is made by performing the growth of GaInAs so as to be doped with Al by mixing TMA as a second material including Al into the first material consisting of TMG(trimethyl gallium), TMIn, and AsH3 used for the growth of GaInAs. The supply quantity of TMA(trimethyl aluminum) and the supply ratio of TMA(trimethyl aluminum) to TMG(trimethyl gallium), TMIn, and AsH3 are controlled so that the concentration of Al in the Al-doped GaInAs active layer 4 may be 1×1018/cm3 or over and that the composition ratio of the Al in the Al-doped GaInAs active layer 4 may be 0.1 or under.;COPYRIGHT: (C)2000,JPO
机译:解决的问题:提供一种生长化合物半导体的方法,该方法可以在生长包括In且不包含Al的化合物半导体的情况下,减少In从生长层的再蒸发,并且可以获得对表面磷光有利的生长层。 。 ;解决方案:在具有有源层量子阱结构失真的AlGaAs半导体激光器中,掺Al的GaInAs有源层4被用作有源层。通过将作为包含铝的第二材料的TMA混合到用于由Al制成的TMG(三甲基镓),TMIn和AsH3组成的第一材料中,通过执行GaInAs的生长以使其掺杂Al,来制造Al掺杂的GaInAs活性层4。 GaInAs的增长。控制TMA(三甲基铝)的供应量以及TMA(三甲基铝)与TMG(三甲基镓),TMIn和AsH 3的供应比,以使掺杂Al的GaInAs活性层4中的Al浓度为1倍。 ; 1018 / cm3以上; Al掺杂的GaInAs活性层4中的Al的组成比可以为0.1以下。COPYRIGHT:(C)2000,JPO

著录项

  • 公开/公告号JP4192293B2

    专利类型

  • 公开/公告日2008-12-10

    原文格式PDF

  • 申请/专利权人 ソニー株式会社;

    申请/专利号JP19980180931

  • 发明设计人 成井 啓修;岡野 展賢;

    申请日1998-06-26

  • 分类号H01L33/00;H01L21/205;H01S5/02;

  • 国家 JP

  • 入库时间 2022-08-21 19:37:10

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