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Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system
Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system
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机译:光刻投影设备,气体吹扫方法,装置制造方法和吹扫气体供应系统
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摘要
A lithographic projection apparatus includes a support configured to support a patterning device, the patterning device configured to pattern a projection beam according to a desired pattern. The apparatus has a substrate table configured to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate. The apparatus also has a purge pas supply system configured to provide a purge gas near a surface of a component of the lithographic projection apparatus. The purge gas supply system includes a purge gas mixture generator configured to generate a purge gas mixture which includes at least one purging gas and moisture. The purge gas mixture generator has a moisturizer configured to add the moisture to the purge gas and a purge gas mixture outlet connected to the purge gas mixture generator configured to supply the purge gas mixture near the surface.
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