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Hydrogen Atom Generation Source in Vacuum Treatment Apparatus, and Hydrogen Atom Transportation Method

机译:真空处理装置中的氢原子发生源及氢原子输送方法

摘要

In a hydrogen atom generation source in a vacuum treatment apparatus which can effectively inhibit hydrogen atoms from being recombined due to contact with an internal wall surface of a treatment chamber of the vacuum treatment apparatus and an internal wall surface of a transport passage, and being returned into hydrogen molecules, at least a part of a surface facing a space with the hydrogen atom generation means formed therein of a member surrounding the hydrogen atom generation means is coated with SiO2. In a hydrogen atom transportation method for transporting hydrogen atoms generated by the hydrogen atom generation means in the vacuum treatment apparatus to a desired place, the hydrogen atoms are transported via a transport passage whose internal wall surface is coated with SiO2.
机译:在真空处理装置中的氢原子产生源中,可以有效地抑制氢原子由于与真空处理装置的处理室的内壁表面和输送通道的内壁表面接触而重新结合并返回。在形成为氢分子的氢原子产生装置周围的表面的至少一部分与形成有氢原子产生装置的空间相对的表面的至少一部分被SiO 2 覆盖。在用于将由真空处理设备中的氢原子产生装置产生的氢原子传送到期望位置的氢原子传送方法中,氢原子经由其内壁表面涂覆有SiO 2

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