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Methods of erasing and designing electrically erasable charge trap nonvolatile memory cells having erase threshold voltage that is higher than an initial threshold voltage

机译:擦除和设计具有高于初始阈值电压的擦除阈值电压的电可擦除电荷陷阱非易失性存储单元的方法

摘要

An electrically erasable charge trap nonvolatile memory cell has an initial threshold voltage, a program voltage that is higher than the initial threshold voltage, and an erase threshold voltage that is lower than the program threshold voltage but is higher than the initial threshold voltage. The programmed electrically erasable charge trap nonvolatile memory cells may be erased by applying an erase voltage for a time interval that is sufficient to lower the threshold voltage the transistor from a program threshold voltage to an erase threshold voltage that is lower than the program threshold voltage, but is higher than the initial threshold voltage. The time interval may be determined by repeatedly performing an endurance test using a time interval that is increased or decreased from an initial time interval, to obtain the time interval that meets an endurance specification, or allows a read to be performed successfully.
机译:电可擦除电荷陷阱非易失性存储单元具有初始阈值电压,高于初始阈值电压的编程电压以及低于编程阈值但高于初始阈值电压的擦除阈值电压。可以通过在足以将晶体管的阈值电压从编程阈值电压降低到低于编程阈值电压的擦除阈值电压的时间间隔内施加擦除电压来擦除编程的电可擦除电荷陷阱非易失性存储单元。但高于初始阈值电压。可以通过使用从初始时间间隔增加或减少的时间间隔重复执行耐力测试来确定时间间隔,以获得满足耐力规格的时间间隔,或者允许成功进行读取。

著录项

  • 公开/公告号US7453736B2

    专利类型

  • 公开/公告日2008-11-18

    原文格式PDF

  • 申请/专利权人 CHANG-HYUN LEE;

    申请/专利号US20060611972

  • 发明设计人 CHANG-HYUN LEE;

    申请日2006-12-18

  • 分类号G11C11/34;G11C16/04;

  • 国家 US

  • 入库时间 2022-08-21 19:29:36

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