首页> 外国专利> Projecting method of reflecting surfaces of reflecting devices using thermal field-radiation and wave equation analogy, and light arrangement like device designed for numeric optimization of required light parameters of reflecting surfaces

Projecting method of reflecting surfaces of reflecting devices using thermal field-radiation and wave equation analogy, and light arrangement like device designed for numeric optimization of required light parameters of reflecting surfaces

机译:使用热场辐射和波动方程类比的反射装置反射面的投影方法,以及为反射面所需的光参数进行数值优化而设计的类似装置的光布置

摘要

their proposal reflecting surfaces of reflective device using the temperature field radiation and wave equation describing the propagation of light, the essence of which is thethe first reflecting surface reflecting the light source of the light ozu00e1ru00ed, which is within the target area evaluated by veliciny svetelnu00e9ho flowafter changing the geometry by changing the angle of the beam reflecting surface of light to the surface of an source of reflecting surfaces.naceu017e using the above described velicin temperature field provides for the velicin relations svetelnu00e9ho field and for the the use snellovy laws of optics.then the reflecting surfaces and the geometry shape according to the requirement svetelnu00e9ho flow.fi. or zu00e1rivu00e9ho flow.fi..sub.e.n.device in the form of an svetelnu00e9 system identified for numerical optimization required svetelnu00fdch parameter reflecting surfaces is tvoreno at least one svetelnu00fdm source (1),which by the ray of light passes through the at least one optical forming element (9) opatrenu00fd reflecting surface (2),at least one of which is inside usporu00e1du00e1na u0161terbina (10) with prostredu00edm (8) with different refractive index on their reflection surfaces (6), while refractive index reflection surfaces (5, 6) is elected by the way.to the requested value svetelnu00e9ho flow.fi. or the total zu00e1rivu00e9ho flow.fi..sub.e.n. in place impact on the landing area is equivalent to the svetelnu00e9mu flow.fi. or the total zu00e1rivu00e9ho flow.fi..sub.e.n.
机译:他们提出的使用温度场辐射和描述光传播的波动方程的反射装置反射面的建议,其实质是在被评估目标区域之内的第一个反射面,该反射面反射的是光的光源。通过改变光束的反射面相对于反射面源表面的角度来改变几何形状之后,使用上述的卵磷脂温度场提供了与卵磷脂的关系。sveteln场和为了使光学系统使用Snellovy律,则应根据流量的要求,反射表面和几何形状。或sveteln u00e9系统形式的z u00e1riv u.en.sub.en设备已确定用于数值优化,所需的sveteln u00fdch参数反映曲面是tvoreno至少一个sveteln u00fdm源(1),光线穿过至少一个光学形成元件(9)的反射面(2),其中至少一个在具有变位(8)的三角镜(10)的内部(10)内部。在它们的反射表面(6)上具有不同的折射率,而折射率反射表面(5、6)则被选择为要求的值。或z u00e1riv u00e9ho流量的总和。在原地对着陆区的影响等同于sveteln u00e9muflow.fi。或z u00e1riv u00e9ho流量的总和。

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