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CONTROLLING ELECTROMECHANICAL BEHAVIOUR OF STRUCTURES WITHIN A MICROELECTROMECHANICAL SYSTEMS DEVICE
CONTROLLING ELECTROMECHANICAL BEHAVIOUR OF STRUCTURES WITHIN A MICROELECTROMECHANICAL SYSTEMS DEVICE
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机译:在微机电系统装置中控制结构的机电行为
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ABSTRACT CONTROLLING ELECTROMECHANICAL BEHAVIOR OF STRUCTURES WITHIN A MICROELECTROMECHANICAL SYSTEMS DEVICE The present invention relates to one embodiment, the invention provides a method for fabricating a microelectromechanical systems device. The method comprises fabricating a first layer comprising a film having a characteristic electromechanical response, and a characteristic optical response, wherein the characteristic optical response is desirable and the characteristic electromechanical response is undesirable; and modifying the characteristic electromechanical response of the first layer by at least reducing charge build up thereon during activation of the microelectromechanical systems device.
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